KM
Koppel, Mart Enn
Tallinn, Estonia
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IPRATE.EUSelect
PATENTS · 2026
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Confidence
Good Confidence. The published tier reflects the selected country, vertical, track, and time window.
Vertical
Track
Window
Performance
Patents · European · Emerging (5y)Rating
Good Confidence
Archetype
Focused Practice
Distinct Clients
3
Success Rate
50.0%
Volume48
Success53
Speed45
DurabilityN/A
RenewalsN/A
Domestic62
Practice profile
Top classes
Computing(17%) · IPC G06F7/535Power(8%) · IPC H02M1/42
Top clients
- Tallinn University of Technology
- Awadhoot Labs Oü
- Rabinowitz, Paul Oren